{"id":214389,"date":"2025-12-04T04:17:07","date_gmt":"2025-12-04T04:17:07","guid":{"rendered":"https:\/\/www.europesays.com\/ie\/214389\/"},"modified":"2025-12-04T04:17:07","modified_gmt":"2025-12-04T04:17:07","slug":"huaweis-2022-patent-details-novel-technique-to-make-2-nm-class-chips-without-euv-tool","status":"publish","type":"post","link":"https:\/\/www.europesays.com\/ie\/214389\/","title":{"rendered":"Huawei\u2019s 2022 patent details novel technique to make 2-nm-class chips without EUV tool"},"content":{"rendered":"<p><a target=\"_self\" class=\"e1yy41x40 ef9u0v01 css-1ankfgb ecgc78b0\" href=\"https:\/\/www.scmp.com\/knowledge\/companies\/huawei\/news?module=inline&amp;pgtype=article\" title=\"\" data-qa=\"BaseLink-renderAnchor-StyledAnchor\" rel=\"nofollow noopener\">Huawei Technologies<\/a>\u2019 three-year-old patent for advanced patterning comparable with 2-nanometre grade technology without extreme ultraviolet (EUV) lithography tools has intensified speculation about a potential breakthrough in advanced chips.<\/p>\n<p datatype=\"p\" data-qa=\"Component-Component\" class=\"e8zc9q40 css-1c6uqr6 ec74h0k1\">The US-sanctioned company is working to patent a metal integration technique for manufacturing semiconductors, which allows narrow metal structures to be integrated using deep ultraviolet (DUV) technology even for \u201cmetal pitches below 21nm\u201d, a feature required for 2nm-class chips.<\/p>\n<p datatype=\"p\" data-qa=\"Component-Component\" class=\"e8zc9q40 css-1c6uqr6 ec74h0k1\">The proposed solution offered a technical pathway to support a 2-nm process using older DUV technology, aiming to bypass US sanctions that block China\u2019s access to the most advanced EUV tools from Dutch firm ASML.<\/p>\n<p datatype=\"p\" data-qa=\"Component-Component\" class=\"e8zc9q40 css-1c6uqr6 ec74h0k1\">The patent, currently pending, was originally submitted by Huawei in June 2022 and made public by China\u2019s national intellectual property regulator in January this year. There is no evidence that the patent has been put to use.<\/p>\n<p datatype=\"p\" data-qa=\"Component-Component\" class=\"e8zc9q40 css-1c6uqr6 ec74h0k1\">Amid growing talk of China\u2019s tech breakthroughs, a Chinese chip industry veteran argued that 14-nm logic chips could rival the performance of Nvidia\u2019s 4-nm chips through integration with advanced memory and novel architecture.<\/p>\n<p datatype=\"p\" data-qa=\"Component-Component\" class=\"e8zc9q40 css-1c6uqr6 ec74h0k1\">Huawei declined to comment on the patent.<\/p>\n","protected":false},"excerpt":{"rendered":"Huawei Technologies\u2019 three-year-old patent for advanced patterning comparable with 2-nanometre grade technology without extreme ultraviolet (EUV) lithography tools&hellip;\n","protected":false},"author":2,"featured_media":214390,"comment_status":"","ping_status":"","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[74],"tags":[37342,381,116709,116710,18,84706,5218,19,3572,17,116708,292,116707,19506,10522,116711,34396,82,24574],"class_list":{"0":"post-214389","1":"post","2":"type-post","3":"status-publish","4":"format-standard","5":"has-post-thumbnail","7":"category-technology","8":"tag-asml","9":"tag-china","10":"tag-chinese-chip-industry","11":"tag-deep-ultraviolet-duv-technology","12":"tag-eire","13":"tag-euv-lithography","14":"tag-huawei","15":"tag-ie","16":"tag-intel","17":"tag-ireland","18":"tag-japanese-patent-analysis-platform-patentfield","19":"tag-nvidia","20":"tag-saqp","21":"tag-semiconductors","22":"tag-shenzhen","23":"tag-sicarrier","24":"tag-taiwan-semiconductor-manufacturing-company-tsmc","25":"tag-technology","26":"tag-us-sanctions"},"share_on_mastodon":{"url":"https:\/\/pubeurope.com\/@ie\/115659370923357598","error":""},"_links":{"self":[{"href":"https:\/\/www.europesays.com\/ie\/wp-json\/wp\/v2\/posts\/214389","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.europesays.com\/ie\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.europesays.com\/ie\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.europesays.com\/ie\/wp-json\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/www.europesays.com\/ie\/wp-json\/wp\/v2\/comments?post=214389"}],"version-history":[{"count":0,"href":"https:\/\/www.europesays.com\/ie\/wp-json\/wp\/v2\/posts\/214389\/revisions"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.europesays.com\/ie\/wp-json\/wp\/v2\/media\/214390"}],"wp:attachment":[{"href":"https:\/\/www.europesays.com\/ie\/wp-json\/wp\/v2\/media?parent=214389"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.europesays.com\/ie\/wp-json\/wp\/v2\/categories?post=214389"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.europesays.com\/ie\/wp-json\/wp\/v2\/tags?post=214389"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}