Micron Technology has started construction on a new cleanroom building at its site in Higashihiroshima, in Hiroshima Prefecture, marking an expansion of its operations in western Japan. <\/p>\n
The company said the build-out will proceed in multiple stages. <\/p>\n
The opening phase will cover about 27871sqm, and is intended to add to Micron’s capacity for advanced memory production in Japan. <\/p>\n
Fujita is the lead contractor for the development. Manufacturing tools are due to be installed in the latter half of 2028, with Micron citing fast-growing requirements for advanced memory as the uptake of AI widens. <\/p>\n
The project has government backing through a subsidy of as much as Y536bn ($3.3bn). <\/p>\n
That support was announced by Japan’s Ministry of Economy, Trade and Industry on 12 September 2025 for advanced memory research, development and manufacturing in Hiroshima. <\/p>\n
Separate media reports have estimated the overall investment at around Y1.5tn ($9.24bn). <\/p>\n
Micron said the spread of AI across data centre systems and edge computing is driving continued increases in demand for advanced DRAM and high-bandwidth memory. <\/p>\n
It added that the Hiroshima development represents the most substantial cleanroom expansion at the site since Micron took over Elpida Memory in 2013. <\/p>\n
The company said the additional capacity would support the introduction of future technologies across its global manufacturing and R&D operations, while also contributing to US-Japan cooperation and wider public-private collaboration in memory technology and supply chain support. <\/p>\n
Micron also said the development would extend its work with Japanese suppliers, academic organisations and local communities, adding to its role within Hiroshima’s semiconductor industry. <\/p>\n
Micron Technology senior vice president of DRAM technology & products Shigeru Shiratake added: “Micron’s Hiroshima site has facilitated key DRAM technology transitions, including the production of 1-beta (1\u03b2) DRAM and the introduction of extreme ultraviolet (EUV) lithography technology for 1-gamma (1\u03b3) DRAM. <\/p>\n
“The Hiroshima team works closely with R&D teams in the US and globally to play a key role in the development of advanced DRAM and HBM for next-generation AI,” he added. <\/p>\n
In the longer term, the company expects the project to contribute to an increase in staffing, including the creation of more than 1,000 jobs. <\/p>\n
Micron Technology executive vice president of global operations Manish Bhatia said: “As AI expands the demand for memory to unprecedented levels, Micron is strengthening its supply capacity across its global manufacturing network, which extends to key locations including Japan, while keeping its cutting-edge investments in the United States at its core.” <\/p>\n