Positive<\/p>\n
High NA EUV in high-volume production on select Intel 18A layers for Intel Core Ultra Series 3<\/p>\n
Yields on High NA EUV matched to existing NXE EUV platform for qualified Intel 18A layers<\/p>\n
Intel Foundry is first in industry to ship high-volume logic product using High NA EUV<\/p>\n
\n +3.40%
\n Since News\n <\/p>\n
\n $1836.49
\n Last Price\n <\/p>\n
\n +$22.50B
\n Valuation Impact\n <\/p>\n
\n $684.36B
\n Market Cap\n <\/p>\n
\n 0.0x
\n Rel. Volume\n <\/p>\n
\n
Following this news, ASML has gained 3.40%, reflecting a moderate positive market reaction.<\/p>\n
The stock is currently trading at $1836.49.<\/p>\n
This price movement has added approximately $22.50B to the company’s valuation.<\/p>\n
\n Data tracked by StockTitan Argus<\/a> (15 min delayed). Upgrade to Gold<\/a> for real-time data.\n <\/p>\n \n Framing this High NA EUV milestone against ASML\u2019s history, recent buyback announcements have produced mixed share reactions, while peers traded lower even as ASML gained 2.87% pre-headline. With low short positioning reported, investors may focus on execution risks and tool adoption pace as key watchpoints.\n <\/p>\n \n High NA EUV integration year Integration of industry\u2019s first commercial High NA EUV system at Intel\u2019s Hillsboro, Oregon R&D site<\/p>\n Date Jul 13<\/p>\n Share buyback update<\/a><\/p>\n Positive<\/p>\n -4.0%<\/p>\n Reported repurchase of 50,763 shares for about \u20ac79.36 million.<\/p>\n Jul 06<\/p>\n Share buyback update<\/a><\/p>\n Positive<\/p>\n +3.1%<\/p>\n Disclosed 29 June\u20133 July buybacks with daily values near \u20ac15.87 million.<\/p>\n Jun 22<\/p>\n Share buyback update<\/a><\/p>\n Positive<\/p>\n -2.0%<\/p>\n Detailed 15\u201319 June repurchases with daily values around \u20ac15.87 million.<\/p>\n Jun 15<\/p>\n Share buyback update<\/a><\/p>\n Positive<\/p>\n +1.9%<\/p>\n Announced 8\u201312 June buybacks totaling near \u20ac15.87 million per day.<\/p>\n Jun 08<\/p>\n Share buyback update<\/a><\/p>\n Positive<\/p>\n +6.7%<\/p>\n Reported 1\u20135 June daily repurchases around \u20ac15.87 million.<\/p>\n Pattern Detected<\/p>\n Recent buyback disclosures have more often coincided with positive share reactions, though responses remain mixed.<\/p>\n high na euv<\/p>\n technical<\/p>\n “The high numerical aperture extreme ultraviolet (High NA EUV) lithography process is an important next step”<\/p>\n A high NA EUV is an advanced version of extreme ultraviolet (EUV) lithography used to etch microscopic patterns on semiconductor wafers; \u201chigh NA\u201d means a larger numerical aperture lens that lets light resolve finer details. Think of it like upgrading from a camera lens that captures general shapes to one that captures much finer detail\u2014this enables smaller, denser, and more complex chips. Investors care because it influences chipmakers’ ability to follow Moore\u2019s Law, affects production costs, equipment spending, and competitive positioning across the semiconductor supply chain.<\/p>\n extreme ultraviolet<\/p>\n technical<\/p>\n “The high numerical aperture extreme ultraviolet (High NA EUV) lithography process is an important next step”<\/p>\n Radiation in the portion of the electromagnetic spectrum between ultraviolet light and X-rays, with wavelengths much shorter than visible light. Think of it as a very high-energy form of ultraviolet that can change materials at tiny scales; that matters to investors because it is used in advanced manufacturing tools, semiconductor chip production, sterilization and scientific instruments, so companies that make or use extreme ultraviolet technology can be linked to growth in those industries.<\/p>\n lithography<\/p>\n technical<\/p>\n “High NA EUV marks a substantial development in semiconductor lithography”<\/p>\n Lithography is the manufacturing step that \u2018prints\u2019 the tiny circuit patterns onto semiconductor wafers using light and specialized stencils, like using a projector and mask to draw a microscopic blueprint. It determines how small, fast, and power-efficient chips can be made, so changes in lithography technology or capacity directly affect production costs, product performance, and which suppliers and manufacturers gain or lose competitive advantage \u2014 key concerns for investors.<\/p>\n process node<\/p>\n technical<\/p>\n “High NA EUV technology on the Intel 18A process node to produce a subset”<\/p>\n A process node is a measure of how advanced a semiconductor manufacturing technology is, often expressed in nanometers, that indicates the size of features the factory can etch on a chip. Smaller process nodes usually allow faster, more power-efficient and denser chips\u2014think of it like higher-resolution printing that fits more detail into the same space. Investors watch process nodes because they affect product performance, production cost, and a chipmaker\u2019s competitiveness and profit potential.<\/p>\n AI-generated analysis. How Rhea-AI works<\/a>. Not financial advice.<\/p>\n
High NA EUV reaches new readiness milestone with first high-volume Logic product <\/p>\n Intel Foundry has entered high-volume manufacturing for a subset of Intel\u00ae Core\u2122 Ultra Series 3 processors, code-named Panther Lake, using ASML\u2019s EXE High NA EUV technology Specific Intel 18A layers are now dual-qualified on High NA EUV in Oregon, with product shipping to customers at yields matched to the NXE platformIntel and ASML<\/a> continue to closely collaborate on High NA EUV readiness with flexibility to incorporate into future nodes based on customer needs <\/p>\n VELDHOVEN, the Netherlands, July 15, 2026 \u2013 ASML<\/a> Holding N.V. (ASML<\/a>) today reported that Intel Foundry is using ASML\u2019s High NA EUV technology on the Intel 18A process node to produce a subset of its Intel\u00ae Core\u2122 Ultra Series 3 processors. This milestone marks an important step in demonstrating High NA EUV readiness in a production environment. <\/p>\n ASML and Intel have worked closely for decades to advance lithography technology and support the continued scaling of semiconductors. The high numerical aperture extreme ultraviolet (High NA EUV) lithography process is an important next step in EUV lithography, developed by ASML to enable more precise patterning for advanced chip manufacturing. <\/p>\n The Intel\u00ae Core\u2122 Ultra Series 3 processors, code-named Panther Lake, are built on Intel 18A. The use of High NA EUV to pattern specific layers of these products provides ASML and Intel Foundry with helpful data to further refine system setup, up time and manufacturing implementation. This paves the way towards broader adoption, utilizing the full capabilities of the technology. <\/p>\n \u201cWith increased resolution and better process control, the introduction of High NA EUV marks a substantial development in semiconductor lithography,\u201d said Christophe Fouquet, ASML President and CEO. \u201cWe are proud to play a role in enabling the smaller, denser patterning that will accelerate advancements in AI and other emerging technologies.\u201d <\/p>\n \u201cThis milestone reflects the close technical collaboration between Intel and ASML and shows how High NA EUV can be integrated into advanced semiconductor manufacturing at scale,\u201d said Naga Chandrasekaran, Executive Vice President and General Manager of Intel Foundry. \u201cBy qualifying the High NA EUV process option on select Intel 18A product layers, our existing fleet of tools are providing customers with increased output, while we develop future options to achieve leading-edge performance, density and manufacturing flexibility on upcoming nodes.\u201d<\/p>\n In 2024, Intel and ASML completed integration of the industry\u2019s first commercial High NA EUV lithography system at the company\u2019s Hillsboro, Oregon, R&D site. Intel Foundry was also the first company to install and pass acceptance testing of the second generation, TWINSCAN EXE:5200B, which builds on the TWINSCAN EXE:5000 and increases output and overlay accuracy, along with an improved light source. With this announcement, Intel Foundry is first in the industry to ship high-volume logic product using High NA EUV.<\/p>\n Media Relations contactsInvestor Relations contactsMonique Mols +31 6 5284 4418Jim Kavanagh +31 40 268 3938 Sarah de Crescenzo +1 925 899 8985Pete Convertito +1 203 919 1714 Karen Lo +886 9 397 88635Peter Cheang +886 3 659 6771 <\/p>\n About ASML
What High NA EUV milestone did ASML (ASML) and Intel announce on July 15, 2026?<\/p>\n
How is ASML\u2019s High NA EUV used in Intel 18A production for Intel Core Ultra Series 3 (ASML)?<\/p>\n
Why is the High NA EUV readiness milestone important for ASML (ASML) investors?<\/p>\n
What role does Intel Foundry play in ASML\u2019s High NA EUV deployment on Intel 18A?<\/p>\n
How do High NA EUV yields compare to ASML\u2019s NXE EUV platform on Intel 18A (ASML)?<\/p>\n
What previous High NA EUV steps did Intel and ASML complete before this 2026 milestone (ASML)?<\/p>\n
\n 2024<\/p>\n
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\n 07\/15\/2026 – 01:01 AM
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ASML is a leading supplier to the semiconductor industry. The company provides chipmakers with hardware, software and services to mass produce the patterns of integrated circuits (microchips). Together with its partners, ASML drives the advancement of more affordable, more powerful, more energy-efficient microchips. ASML enables groundbreaking technology to solve some of humanity’s toughest challenges, such as in healthcare, energy use and conservation, mobility and agriculture. ASML is a multinational company headquartered in Veldhoven, the Netherlands, with offices across EMEA, the US and Asia. Every day, ASML\u2019s more than 44,500 employees (FTE) challenge the status quo and push technology to new limits. ASML is traded on Euronext Amsterdam and NASDAQ under the symbol ASML. Discover ASML \u2013 our products, technology and career opportunities \u2013 at www.asml.com.<\/p>\n![\"\"](\"https:\/\/www.europesays.com\/netherlands\/wp-content\/uploads\/2026\/07\/1784110604_916_ti.gif\"\/)
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\n FAQ
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\n ASML and Intel announced that High NA EUV is now used in high-volume manufacturing for select Intel 18A layers. According to ASML, Intel Foundry is shipping Intel Core Ultra Series 3 Panther Lake processors patterned with High NA EUV.
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\n High NA EUV is used to pattern specific Intel 18A layers for a subset of Intel Core Ultra Series 3 processors. According to ASML, these layers are dual-qualified in Oregon, with yields matched to the existing NXE EUV platform.
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\n The milestone shows High NA EUV operating in a production environment for high-volume logic products. According to ASML, this use provides data to refine system setup, uptime and manufacturing, paving the way for broader adoption in future advanced nodes.
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\n Intel Foundry is using ASML\u2019s High NA EUV on the Intel 18A node for select product layers. According to ASML, Intel Foundry is the first company to ship high-volume logic products patterned with High NA EUV technology.
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\n According to ASML, product shipping from Intel 18A layers patterned with High NA EUV achieves yields matched to the NXE platform. This suggests comparable manufacturing performance for those qualified layers within Intel\u2019s Oregon operations.
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\n In 2024, Intel and ASML completed integration of the first commercial High NA EUV system at Intel\u2019s Hillsboro R&D site. According to ASML, Intel also installed and passed acceptance testing of the second-generation TWINSCAN EXE:5200B tool.
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